Multichip SiNx Membrane Arrays
Batch-processable chip arrays for parallel fabrication, uniformity, and streamlined device preparation.
Norcada Multichip Array devices contain multiple SiNx membrane chips held together within a support frame. This arrangement allows for parallel processing of SiNx membranes for high uniformity between samples. Multichips are ideal for applications involving spin coating photoresists, Electron Beam Lithography (EBL) and Focused Ion Beam (FIB) processing, or cell culturing sample prep.
Multichip Arrays have a central support piece designed to fit over a standard spin coater vacuum chuck. The outer sacrificial edge of the Multichip is optimized to isolate spin coating edge bead effects from the SiNx membrane devices for improved process uniformity.
After processing at your lab, multichip arrays can easily be singulated into individual chips. Multichips are available for standard 3.0mm dia. TEM-grid chips, as well as standard 5mmx5mm and 10mmx10mm square frame X-ray chips.
Designed for Parallel Processing:
Each multichip device includes:
A central vacuum-compatible support for spin coaters
A sacrificial perimeter that reduces edge bead effects during coating
Easy singulation grooves for post-process chip separation
Available for chip formats including:
3.0 mm TEM grids
5 × 5 mm and 10 × 10 mm X-ray frames
Custom chip designs (upon request)
Available Features & Options
Customize your multichips for your experimental setup:
| Feature | Description | Notation |
|---|---|---|
| Low-Resistivity Silicon Frames | Enhances charge/heat dissipation during SEM, EBL, and FIB | -LR |
| Noise Reduction Underlayer (U/L) | Reduces electrical cross-talk; recommended for in situ biasing and ionic translocation | -AO or -CO |
| EBL/FIB Alignment Marks | Passivated global/local marks for patterning, focusing, and alignment | MC8E or MC12E |
| Top Layer Modifications | Hydrophobic/hydrophilic coatings, electrode patterning, custom nano-features | Upon Request |
All standard NORCADA chip formats (TEM, X-ray, Square, Round, NanoPore, and UberFlat™) can be manufactured in multichip format for high-volume or integrated research environments.
SiNx Specification Ranges:
Membrane stress: 10 MPa to 1100 MPa
Thickness: 10 nm to 6000 nm
Membrane area: 5 µm × 5 µm up to 100 mm × 100 mm (or Ø20 µm to Ø100 mm)
Frame size: 1 mm × 1 mm up to 150 mm × 150 mm
Frame thickness: 100 µm (MX), 200 µm (NX), 380 µm (PX), 500 µm (QX), and thicker on request
Formats: Single-window or multi-window arrays
Looking for something more specialized? We also offer SiNx membranes as part of advanced solutions for:
Nanopore and Bio-physics (Genomics/Proteomics)
X-ray, Ion, and Electron Transmission (Beamline windows and detectors)
In-situ Liquid & Gas Cells (Electrochemistry, Electro-biasing, and Heating)
Multichip Arrays of 3mm dia. TEM frame SiNx Membranes, 200µm thick
*Please contact for pricing and availability
| Part Number | SiNx Thickness | Window Size Area | Additional Features |
|---|---|---|---|
| MC12-NT005A-LR | 50nm | 0.05×0.05mm | N/A |
| MC12-NT005Y-LR | 20nm | 0.05×0.05mm | N/A |
| MC12-NT005Y-AO/O-LR | 20nm | 0.05×0.05mm | U/L: 60nm SiOx |
| MC12E-NT005A-LR | 50nm | 0.05×0.05mm | EBL Alignment Marks |
| MC12E-NT005Y-LR | 20nm | 0.05×0.05mm | EBL Alignment Marks |
| MC12E-NT005Y-AO/O-LR | 20nm | 0.05×0.05mm | EBL Alignment Marks U/L: 60nm SiOx |
Multichips Arrays of 5x5mm X-ray frame SiNx Membranes, 200µm thick
*Please contact for pricing and availability
| Part Number | SiNx Thickness | Window Size Area | Additional Features |
|---|---|---|---|
| MC8-NX5150A-LR | 50nm | 1.50×1.50mm | N/A |
| MC8-NX5150C-LR | 100nm | 1.50×1.50mm | N/A |
| MC8E-NX5150A-LR | 50nm | 1.50×1.50mm | EBL Alignment Marks |
| MC8E-NX5150C-LR | 100nm | 1.50×1.50mm | EBL Alignment Marks |
| MC8-NBPX5004Z-AO/O-HR | 12nm | 0.04×0.04mm | U/L: 60nm SiOX |
| MC8E-NBPX5004Z-AO/O-HR | 12nm | 0.04×0.04mm | EBL Alignment Marks U/L: 60nm SiOX |
Need Custom Fabrication for Your Project?
Reach out to us to learn more about how we can customize your solutions or visit our Innovation Platform page for more information.